A device for film deposition by
Langmuir—Blodgett technique LT-2211

Types of depossited LB-films	X-, Z-, Y-types of LB-films. Horizontal precipitation. Manual control for mode combination available.
Number of barriers	Two: symmetrical compression, autonomous movement
Dimensions of free surface in the trough	266*100 mm (length*width)
Changeable area in the trough	266 to 90 cm 2
Depth in shallow working area	6 mm in base version, 1.7 mm in alternative version
Dipping well (in base version)	depth to 50 mm, width max 84 mm
Liquid medium volume in the trough	390 ml in base version, 45 ml in alternative version
Substrate dimensions (for submerging in the dipping well)	up to 50*80*15 mm (height*depth*width)
Compression rate by the barriers	54–210 mm/min
Thermostating paltform	Yes. Liquid thermostating by outer facilities in temperature range 0°С...80°C. Nozzles to connect pipes of inner diam. 6 mm
Surface tension sensor (microbalance)	FM-02 (on a separate stand, vertical position may be adjusted). Wilhelmy plate 15*15 mm (accuracy ~0.1 mN/m). Working range 0–100 mN/m (may be adjusted). Sensitivity 0.01 mN/m.
Dipper	VT-04 (on a separate stand, vertical position may be adjusted). Dipper mechanism stroke 85 mm. Vertical translation rate 0.12–70 mm/min. Step of the dipper mechanism velocity change 0.1 mm/min. The unit may be used separately for submerging a substarte into liquid under control from host PC (programmable).
Delay between consequent layers deposition	0–10000 s
Deposition rate	0.002 to 2 mm/min
Changeable PTFE trough	Base dimensions 310*156*10 mm (w*d*h), maximum window size for dipping well 94*100 mm.
Additional accessories	Substrate clamping holder for fixing the sample on the dipper lever (substrate thickness up to 4 mm). Rig for film deposition by the horizontal precipitation method (by liquid medium draining).
Applications	- Isotherm measurement: uniform or step-wise compression available. The number of surfactants in multicomponent mixtures is unlimited. - Deposition of multifunctional monomolecular and multilayered films from liquid surafce on solid substrates (the film keeps exact structure at its transferring onto solid surface). - etc.
Overall dimensions	Trough unit – 390*175*110 mm (w*d*h); Control unit – 185*240*105 мм  (w*d*h); Weight 7/9 kg.  Additional accessories are mounted on separate stands.
Supply voltage	220 V 50 Hz
Power consumption	not more than 100 W

 

TECHNIQUES

Deposition of X-type LB film
Deposition of Y-type LB film
Deposition of Z-type LB film
Note. * Horizontal precipitation (HP) method (by liquid medium draining). [Article]     The method provides surface modification by extremely uniform and homogenous monolayer films (see, for example this paper). HP method allows transferring of monolayer films at various surfaces simultaneously from huge variety of surfactants (both in solid and liquid state) despite of polar head structure. The process of deposition is simple and fast. In particular, the surface of metallized silicon wafer can be modified by HP method within 3–5 minutes.

* Host PC is not included in the delivery set

Dipper unit VT-04	Microdoser DT-03

Software for LB trough control and data acquisition is a Win32 application running under OS Windows XP/Vista/7/8/10.

The software is built according to the modular scheme oriented to perform specific application technique and provides all preliminary settings and calibration necessary for the LB trough operation as well control over the systems (mechanisms of the barrier movement and sample dipping/lifting) at the film application.

Acquired data can be saved in special format or text files and can be then processed, visualized and analysed in the program itself or with third party software (e.g. SurfaceXplorer package or Microsoft Excel).

Minimal configuration of host PC (not included in the delivery set): Celeron^® 1.7 GHz, RAM 512 MB, HDD 160 GB, VRAM 64 MB, monitor 1024x768x32 bit, MS Windows^® XP SP2, 1 free USB port.