A device for film deposition by
Langmuir—Blodgett technique LT-211

Types of depossited LB-films:	X-, Z-, Y-types of LB-films. Horizontal precipitation. Deposition on tape (flexible) substrate. Manual control for mode combination available.
Number of barriers:	Two
Liquid medium volume:	1200-1500 cm3
Full free surface area:	830 cm2
Maximum free surface area confined with the barrier:	800 cm2
Compressed (effective) area:	600 cm2
Velocity range of the barrier motion:	- single side compression – 0.01 to 180 mm/min - symmetrical compression – 0.02 to 360 mm/min
Dipping well:	28x130x110 мм (w-d-h)
Maximum dimensions of the immersed substrate:	26x128x120 мм (w-d-h)
Dipper mechanism stroke:	86 mm (vertical position of the unit can be adjusted manually)
Dipper mechanism velocity range:	0.01–40 mm/min,
Step of the dipper mechanism velocity change:	0.1 mm/min
Possibility of altering different monomolecular layers deposition:	Available
Delay between the layers deposition:	0–100000 s
Surface tension sensor:	Two sensors using paper Wilhelmy plate 15x15 mm (vertical position of the sensors may be adjusted manually)
Working range of the surface tension sensor:	0-80 mN/m (stepped and fine adjustment of the range are available)
Sensitivity of the surface tension sensor:	0.01 mN/m
Doser for substance feed to aqueous surface:	One of below options are available: - A syringe-type (DT-03): substance reserve1 ml (2 ml, 5 ml, 10 ml syringes applicable as well); motion range of leading rod – 65 mm - Peristaltic pump (RT-01): embedded in the trough frame, supply rate 0.157 ml per revolution
Overall dimensions:	Trough with mounted rig - 600x300x520 mm (w-d-h); Control unit - 185x240x105 mm (w-d-h); Weight 21 kg.
Supply voltage:	220 V 50 Hz
Power consumption:	not more than 100 W
Additional accessories:	Substrate clamping holder for fixing the sample on the dipper lever. Rig for film deposition by the horizontal precipitation method (by liquid medium draining). Rotating barrier for substance film transfer into the working zone. A unit for tape substrate winding with two guides. A doser for substance feed on water surface. A base platform for liquid thermostating of the trough in range 0°С...80°C by outer facilities.

 

TECHNIQUES

Deposition of X-type LB film
Deposition of Y-type LB film
Deposition of Z-type LB film
Note. * Horizontal precipitation (HP) method (by liquid medium draining). [Article]     The method provides surface modification by extremely uniform and homogenous monolayer films (see, for example this paper). HP method allows transferring of monolayer films at various surfaces simultaneously from huge variety of surfactants (both in solid and liquid state) despite of polar head structure. The process of deposition is simple and fast. In particular, the surface of metallized silicon wafer can be modified by HP method within 3–5 minutes.
Roll-To-Roll deposition technique engages additional accessories in the set of LB trough LT-211 to deposit monomolecular film on tape (continuous deposition on flexible substrate).

* Host PC is not included in the delivery set

Microdoser DT-03	A rotating barrier
A mounted unit for the tape substrate winding	A set of two guides for tape substrate

Software for LB trough control and data acquisition is a Win32 application running under OS Windows 95/98/Me/NT/2000/XP/Vista.

The software is built according to the modular scheme oriented to perform specific application technique and provides all preliminary settings and calibration necessary for the LB trough operation as well control over the systems (mechanisms of the barrier movement and sample dipping/lifting) at the film application.

Acquired data can be saved in special format or text files and can be then processed, visualized and analysed in the program itself or with third party software (e.g. SurfaceXplorer package or Microsoft Excel).

Minimal configuration of host PC (not included in the delivery set): Celeron^® 1.7 GHz, RAM 512 MB, HDD 160 GB, VRAM 64 MB, monitor 1024x768x32 bit, MS Windows^® XP SP2, 1 free USB port.