Langmuir–Blodgett trough ‘LT-111’ is intended

• for application of monomolecular films on solid samples according to the Langmuir–Blodgett (LB) technique and for deposition of multimolecular films by corresponding layer-by-layer technique;
• for measurement of compression isotherms (without limitation in number of surfactants in multicomponent mixtures);
• for application of monomolecular films on solid samples according to the horizontal precipitation (HP) technique;
• for experiments on construction mono- and mulimolecular composite coatings on solid surface;
• for altering the surface properties (hydrophylic, optical, electrical etc. behavior);
• for fundamental research at production of ultrathin films and their application as insulating and protective coatings, elements of molecular electronics, in biological studies for creation of analogs for bilayer lipid membranes etc..

This version features extra-wide dipping well suitable for flat samples of diameter up to 125 mm. That allows experimentation with, for example, silicon wafers directly.

 

 

 

Number of barriers:	One
Velocity range of the barrier motion:	54–210 mm/min (single side comression)
Full free surface area:	463+1 cm2
Maximum free surface area confined with the barrier:	440+1 cm2
Minimum free surface area confined with the barrier:	128+2 cm2
Compressed (effective) area:	312 cm2
Liquid medium volume:	1000-1030 cm3
Dipping well:	depth 110 mm, widht 130 mm
Maximum dimensions of the immersed substrate:	125х125x4 mm (h-w-t)
Delay between the layers deposition:	0–100000 s
Dipper mechanism stroke:	85 mm (vertical position of the unit can be adjusted manually)
Dipper mechanism velocity range:	0.12–70 mm/min, step of the velocity change 0.1 mm/min
Deposition rate:	0.002 to 2 mm/min
Surface tension sensor:	Wilhelmy plate 2 cm2, accuracy ~0.1 mN/m (vertical position of the sensor can be adjusted manually)
Number of surafce tension sensors:	One
Sensitivity of the surface tension sensor:	0.05 mN/m
Working range of the surface tension sensor:	0-80 mN/m (stepped and fine adjustment of the range are available)
Overall dimensions:	Trough with mounted rig - 400x200x250 mm (w-d-h); Control unit - 220x165x105 mm (w-d-h); Weight 7/8 kg.
Supply voltage:	220 V 50 Hz
Power consumption:	not more than 40 W
Additional accessories:	Substrate clamping holder for fixing the sample on the dipper lever. Rig for film application by the horizontal precipitation method (by liquid medium draining). Base slab suitable for liquid thermostating by outer source (not included).

Deposition of X-type LB film
Deposition of Y-type LB film
Deposition of Z-type LB film
Note. * Horizontal precipitation (HP) method (by liquid medium draining). [Article]     The method provides surface modification by extremely uniform and homogenous monolayer films (see, for example this paper). HP method allows transferring of monolayer films at various surfaces simultaneously from huge variety of surfactants (both in solid and liquid state) despite of polar head structure. The process of deposition is simple and fast. In particular, the surface of metallized silicon wafer can be modified by HP method within 3–5 minutes.